Country-of-the-Fine art Silicon Very Large Scale Integrated Circuits: Industrial Face of Nanotechnology

Ever since the proposal and demonstration of breakthrough dots in 1980 past Efros' brothers and Dr. Ekimov, the relentless progress of nanotechnology has been unstoppable. And nowhere this progress is more than axiomatic equally in the Si Very Big Scale Integrated Circuits (VLSI) technology. The minimum feature sizes of the Si VLSI reduced to seven nm in 2017 with plans for the 5 nm and fifty-fifty 3 nm engineering science. With over 20 billion transistors on a foursquare cm chip in 2018 and the expectations of reaching 1 trillion transistors on chip in the near future, the complication of the VLSI
fabrication processes and the commensurate costs are overwhelming. The quality of the crystalline silicon becomes crucial to guarantee an acceptable yield, and the device physics involved is new and counter-intuitive. Merely industrial silicon nanotechnology is not limited to crystalline materials. Baggy and polysilicon Thin Film Transistors made on glass or even on fabric or paper enable integrated circuits with 50 nm tolerances over square meter sizes. These technologies accept become disruptive with applications ranging from amusement to communications dubbed 5G and Beyond 5G, to robotics and driverless cars, and to the new electronic and communication warfare. This talk will focus on the Computer Aided Design compact models required to support the pattern, label, and parameter extraction for Si VLSI and a-Si and polysilicon integrated circuits, and on the new patent awaiting VLSI test techniques needed to identify and diagnose bad or faked VLSI chips.


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  • Co-sponsored past Baltimore Section Jt Affiliate, ED15/SSC37
  • Starts 15 Dec 2020 12:00 PM
  • Ends twenty January 2021 07:00 PM
  • All times are EST
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  Speakers

Prof. Michael Shur of Rensselaer Polytechnic Institute

Topic:

State-of-the-Art Silicon Very Large Scale Integrated Circuits: Industrial Face of Nanotechnology

Ever since the proposal and demonstration of quantum dots in 1980 by Efros' brothers and Dr. Ekimov, the relentless progress of nanotechnology has been unstoppable. And nowhere this progress is more evident as in the Si Very Large Scale Integrated Circuits (VLSI) technology. The minimum feature sizes of the Si VLSI reduced to seven nm in 2017 with plans for the v nm and fifty-fifty 3 nm technology. With over 20 billion transistors on a foursquare cm bit in 2018 and the expectations of reaching one trillion transistors on chip in the near futurity, the complexity of the VLSI fabrication processes and the commensurate costs are overwhelming. The quality of the crystalline silicon becomes crucial to guarantee an acceptable yield, and the device physics involved is new and counter-intuitive. But industrial silicon nanotechnology is not limited to crystalline materials. Amorphous and polysilicon Sparse Film Transistors fabricated on glass or fifty-fifty on cloth or paper enable integrated circuits with l nm tolerances over square meter sizes. These technologies have become disruptive with applications ranging from
entertainment, to communications dubbed 5G and Across 5G, to robotics and driverless cars, and to the new electronic and communication warfare. This talk volition focus on the Computer Aided Blueprint compact models required to support the design, characterization, and parameter extraction for Si VLSI and a-Si and polysilicon integrated circuits, and on the new patent pending VLSI test techniques needed to identify and diagnose bad or faked VLSI chips.

Biography:

Michael Shur

Patricia West. and C. Sheldon Roberts Professor of Solid State Electronics

Michael South. Shur received MSEE Caste (with honors) from St. Petersburg Electrotechnical Institute, and PhD. and Dr. Sc. Degrees from A. F. Ioffe Institute. He is Patricia and Sheldon Roberts Professor of Solid Land Electronics and Professor of Physics, Applied Physics, and Astronomy at Rensselaer Polytechnic Institute and co-founder, President and CEO of Electronics of the Future, Inc. He was as well a co-founder and Vice-President of Sensor Electronics Technology, Inc. (a leading producer of deep ultraviolet LEDs) and founder of co-founder of several other startups, including Electronics of the Future, Inc. Dr. Shur is Life Fellow of IEEE, APS, ECS, and SPIE, Swain of the National Academy of Inventors, OSA, IET, MRS, WIF, and AAAS. Dr. Shur is Distinguished Lecturer of IEEE EDS lodge. His awards include Saint petersburg Technical University and Academy of Vilnius Honorary Doctorates, Distinguished Faculty Naval Inquiry Fellowships, William H. Wiley 1866 Distinguished Kinesthesia Honor, Rensselaer Outstanding Engineering science Professor Award, Institute of Electronic Technology Achievement Medal, ECS Electronic and Photonics Honor, Jefferson Science Fellowship, Recognition Award from iNEER, Tibbetts Award for Technology Commercialization, IEEE Sensors Council Technical Achievement Accolade, IEEE Donald Fink Best Newspaper Laurels, IEEE Kirchmayer Laurels, the Gilded Medal of the Russian Education Ministry, van der Ziel Laurels, Senior Humboldt Honor, Pioneer Laurels, RPI Technology Inquiry Award, Wiley Honor, RPI Outstanding Kinesthesia Award, and several All-time Paper Awards. Dr. Shur was listed past the Found of Scientific Data as Highly Cited Researcher. His h-index is 111. In 2009, the Lithuanian Academy of Sciences elected him its Foreign Member.

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Accost:CII 6015 Rensselaer Polytechnic Institute 12180 United states, 110 eighth Street, Troy, New York, United States, 12180


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